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Sputtering Targets

Metal Sputtering Target - Alloy Sputtering Target - Ceramic Sputtering Target

Sputtering Target - Customized Sputtering Target - Sputtering Target Application

CRM material co.,limited (CRM) is an experter in manufacture sputtering targets. CRM can offers a full line of sputtering targets with various components from industrial grade to super high purity. Mostly targets are manufacture by programs. Also CRM can Sputtering Targetmanufacturetargets that are less and rarefrequently used compositions. Also CRM can offer some addition server includesubstrade, bonding, backing plate. CRM material co.,limited  insisted  on improving  our fabrication techniques for supply more values and better products.

Sputtering targets customization: CRM material co.,limited is specialized in making various sputtering targets. We have many raw material compounds lines, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special sputtering targets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship.

Good news: CRM developed a full series of ceramic sputtering targets for DC sputter!!! Ta2OX,Nb2OX,TiOx,ZrOx,CdS...

Sputter Coating Application: Sputter coating thin film primary be used field include decorate thin film, construction glass, automobile widow, low radiation glass, plane display, optical communication/ optics field, light date store field, thin film solar cell, magnetism date store field. ( Details )

Sputtering targets fabrication methods:
CRM have lots of fabrication methods, and we will select the best ways to manufacture products base on raw materials speciafication. Some available methods show as below: Vacuum Induction Melting (VIM), Vacuum induced levitation melting furnace Vacuum Sintering, Vacuum Melting Casting, Vacuum Arc Melting, Hot Pressing (HP), Hot Isostatic Pressing (HIP), Cold Isostatic Pressing(CIP), cold pressing and sinter, FZ, CZ, CVD...... Now our plasma spray technique is studying and improving, we will can offer some samples.

Backing Plates and Bonding Service: Backing plates include OFHC copper, Aluminum, Titanium, Stainless steel or Molybdenum. The dimension will base on your drawing and you design. 
Bonding Service
º Back metallisation up to 1600 x 1000mm
º Metallic and non-metallic bond coverage >98%
º Ultrasonic c-scan on bond integrity

Sputtering Targets Shape and Size: Discs, Rectangle, Step, Plates, Sheets, Tube, Foils, Rods, Taper, Ring, S-Guns, Custom-Made.
Disk targets, column targets, step wafer targets (Dia<350mm, Thickness >1mm )
Rectangle Targets, Slice Targets, Step Rectangle Targets (Longth <1500mm, Witdh<300mm, Thickness>1mm)
Tube Target / Rotation sputtering Target (Outer Dia < 300mm, Thickness > 2mm)

Sputtering Targets list (By Application) :

Semiconductor Correlative targets / Thin film of electrode and wire layout : aluminium target, copper target,gold target,silver?target, palladium target, platinum target,alumium silicom target,aluminium silicom copper alloy target and so on.

Thin film of packet eletrode: Molybdenum targets,tungsten targets,titanium targets?and so on;

Thin film of conglutinate: Tungsten target, titanium targets and so on.
Thin insulating film:PbTiZrO3 targets and so on.

Hard disk with a magnetic thin film magnetic recording: CoCrTa alloy targets, CoCrPt alloy targets,CoCrTaPt alloy target...

Magnetic head of thin film: CoTaCr alloy targets,CoCrZr alloy target ...

Tificial crystal film: CoPt alloy target,CoPd alloy targets ...

Phase change optical disk recording films: TeSe target,SbSe target,GeSbTe targets,GeTe alloy targets ...

Magneto-optical recording films for disk: TbDyCo allohy targets,TbDyFe targets,Al2Oe targets,MgO targets,SiN targets...

CD reflective film: Aluminium targets,AlTi alloy targets, AlCr targets,Gold targets,Gold alloy targets...

CD Protection Film: SiN targets,SiO2 targets,ZnS targets ...

Transparent conductive film for flat display: ITO target,AZO targets,silicon dioxide target,titanium target,chromium targets...

Display wiring film electrode: Molybdenum targets, tungsten target,Titanium target, tantalum targets, Chromium target,aluminium targets,aluminum titanium alloy targets,AlTa alloy targets,Aluminium neodymium alloy target,AlNd alloy targets...

Display Thin Film electroluminescent: ZnS doped Mn targets, ZnS doped Tb targets, ZnS doped Eu targets, Y2O3 targets, Ta2O5 targets, BaTiO3 targets...

Decorative Film: Titanium targets, Zirconium targets, Chromium targets, TiAl targets, SS targets ...

Low resistance film: NiCr target, NiCrSi alloy targets, NiCrAl targets, NiCu alloy targets...

Superconducting thin films: YBCO targets (YBaCuO targets), BiSrCaCuO targets ...

Tools plating film: Nitride targets, Carbide targets, Boride targets, Cr target, Ti targets, TiAl alloy targets,Zr target, Graphite targets, Aluminum 99.99%, Chromium 99.5%, Nickel/Chromium 99.5%, Nickel & Alloys 99.5%, Tungsten Carbide C:0.4%, Titanium & Alloys ( TiAL, TiALY) 99.5%, Zirconium 99.5%

Thin film solar cell:Silicon sputtering targets, Gallium Arsenide (GaAs)99.999%, ITO 99.99%,Titanium metal 99.9%,Aluminum Zinc Oxide (AZO) 99.99%,Zinc Oxide (ZnO) 99.99% Silicon Dioxide ( Si02 ) 99.99%, Titanium Oxide (TiO2 ) 99.99%, Molybdenum 99.9%, Nickel / Chromium ( 80:20 )99.5%, NiV targets, Chromium target 99.5~99.9%, Cadmium Telluride (CdTe) 99.999%,Cadmium Sulfide (CdS), 99.99%, 99.999%, Platinum (Pt) 99.99%, GaSe target, GaS target, CuGa target, CuIn target, CuInGaSe (CIGS) 99.99%, CuInSe(CIS) 99.99%, ZnAl alloy sputtering target, CIG sputtering target (5N)
Sputtering Targets Materials list:
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, Carbon, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), lanthanum (La), Lead (Pb), Lutetium (Lu), Manganee (Mn), Molybdenum (Mo), Magnesium (Mg),Neodymium (Nd), Niobiums (Nb), Nickel (Ni), Palladium (Pd),Platinum (Pt), Praseodymium (Pr),Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc),Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ;
Alloy Sputtering Targets:AlCu, AlCr, AlMg,AlNd, AlSi, AlSiCu, AlAg, AlV,CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB ,CoNi, CoNiCr, CoPt,CoNbZr,CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr,DyFe, DyFeCo, FeB,FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoNb, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo, NiFe, NiMn, NiNbTi, NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiAl, TiNi, TiCr, WRe, WTi, WCu, ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, ZnAl, ZnMg, other custom alloy targets ;
Ceramic sputtering target:
Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2,other Doped boride ceramic targets
Carbide Ceramic Sputtering Targets : B4C,Cr3C2,HfC,Mo2C,NbC,SiC,TaC, TiC, WC, W2C, VC, ZrC,other Doped carbide ceramic targets
Fluoride Ceramic Sputtering Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3, other Doped fluoride ceramic targets
Nitride Ceramic Sputtering Targets :AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN, other Doped nitride ceramic targets;
Oxide Ceramic Sputtering targets: Al2O3, Sb2O3, ATO ,BaTiO3, Bi2O3, CeO2, CuO, Cr2O3 ,Dy2O3 ,Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr(TiO2)2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2(unstabilized), ZrO2-5-15wt%CaO) and other multielement oxide targets;

Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe, other Doped selluirde ceramic targets;
Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2, other Doped silicide ceramic targets ;
Sulfide Ceramic Sputtering Targets: AgS, Ag2S, CuS, Cu2S, Sb2S3, As2S3, CdS, FeS, GaS, GeS, PbS, SnS, In2S3, MoS2, NbS1.75, TaS2, WS2, ZnS, other Doped sullfide ceramic targets ;
Telluride Ceramic Sputtering Targets:Al2Te3,Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, TmTe, WTe2, ZnTe, other Doped telluride ceramic targets ;
Customized sputtering targets: AZO, Cr-SiO, CIGS, ITO, IGZO, GaAs, Ga-P, GaSb, In-Sb, InAs, InP, InSn, LSMO, Na3AlF6 , YBCO, LCMO, YSZ, GeSbTe and so on custom sputtering targets;



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