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Sputtering Target Application

Metal Sputtering Target - Alloy Sputtering Target - Ceramic Sputtering Target

Sputtering Target - Special Sputtering Target - Sputtering Target Application

Application sputter coating thin film primary be used field:Decorate thin film, construction glass,automobile widow,low radiation glass,plane display,optical communication/ optics field, light date store field, magnetism date store field.

Target Size:

Melting target: Longth<1600mm, With<360mm, thickness>1mm;

Powder metallargy target: Diameter <465mm,thickness>1mm;
1.Decorate thin film: inlucde gold color series,silver color series,black clor series,multicolor series.Can be used in water,glasses,water faucet,doorknob,pen and so on decorate hardwareand arts. Mainly target include,titanium sputtering target,aluminium sputtering target,zirconium sputtering target,gold sputtering target and so on metal sputtering target, chromium nitride sputtering target,(silver color),zirconium nitirde sputteirng target(gold color),titanium nitride sputteing target(gold color),titanium carbide sputtering target(silver color) and other ceramic sputtering target??
2.Construction glass,automobile galss,low radiation glass: Our company offer sputtering target that be used construction glass,automobile glass, low radiation glass industry field. We produced chromium, titanium, tin, niobium, zinc,silicon,silver,nickel chromium alloy, silicon aluminium alloy,zinc aluminium alloy,titanium oxide,stainless steel, and so on plane sputtering target and plasma/cast rotary target.Our targets can suitable be mostly used general coating system, include LEYBOLD,BOC AIRCO and other coating system,and some coating system of custome designed by themselvies. Especially about chromium target, composition uniformity,grain size less than 50um, can manufacture any shape targets by customer's drawing. At the same time, we offer rotary target, generaly ratary target include,tin target,titanium oxide target,ITO target,AZO target, aluminium silicon target, silver target,chomium target,stainless steel target, and zinc base alloy target.

Material

Purity

Material

Purity

Material

Purity

Ag

4N

NiCr

2N5

Ti

2N5

Al

3N 4N

NiV

2N7

W

3N

Au

4N

Si

5N

AZO

3N

Cr

2N5-4N

SiAl

3N

ZnSn

3N

Mo

3N5

Sn

3N

Zr

2N

3.Plane display:

NbOx targetManufacture many kind of sputtering target of TN, STN, TFT, FED, PDP and OLED, CF and base element of many kind of display.

Mainly target: silicon dioxide(99.998%), silicon (adulterate, low resistance), ITO(99.99%,RD>99%), chormium(<99.99%), aluminium, silver, tunsten, molybdenum, tantalum, TiOx sputtering targets, NbOx sputtering targets, AZO sputtering targets and so on.

CRM can manufacture any shape targets by customer's drawing.

 

Materials

Purity

Materials

Purity

Materials

Purity

Ag

4N

AlNd 99.99%

Ti

2N7, 4N

Al 5N AlNiNd 99.99%

TiOX

4N
Al2O3 4N

Mo

3N5

W 3N5

Au

4N

Nb

3N5

ZnAlO

3N

Cr

4N

Si

5N

- -

Cu

4N

SiO2 4N5 - -
ITO 4N

Ta

3N5

- -

4.Optical communication/optical industry: Offer targets be used in field DWDM(Dense Wavelength Division), TFF(thin film filter), include tantalum pentoxide disk, silicon dioxide disk target,high pure/ big dimension tantalum metal target,tantalum niobium alloy target,silicon target. They can suitable LEYBOLD,OPTORUN,SHINCRO AND VEECO..etc coating system. At the same time, we offer niobium,titanium,nickel,chromium,gold,silver target,and high pure evaporation coating materials, can satisfied optical lens,crystal and optical communication field, coating of element of source and sourceless.
5.Optical date store industry: Offer many kinds of sputteirng target be applied CD/DVD-ROM,CD/DVD-R,MO and CD/DVD-RW, include aluminium target,copper target, high pure silver target, gold target,silicon target,titanium aluminium alloy target,nickel vanadium alloy target and so on.

Material

Purity

Material

Purity

Material

Purity

Al 99.999% Cu 99.99% SiN 99.9%
Ag 99.99% NiV 99.99% TiAl 99.95%
AlCr 99.95% Si 99.999% ZnS 99.99%
Au 99.99% SiO2 99.995%    


6.Magnetism date store industry: Applied in hard film, inner film, and read-write film on surface of hard disk of computer. include high pure carbon target(99.999%),chromiun target/chromium molybdenum alloy target/chromium tungsten alloy target/chromium vanadium alloy target/chromium molybdenum tantalum alloy target/titanium aluminum alloy target/nickel chromium aloy target/nickel vanadium alloy target/nickel iron alloy target etc...

Material

Purity

Material

Purity

Material

Purity

Al 99.999% CoNi 99.95% Si 99.999%
Al2O3 99.999% CoNiFe 99.95% Ta 99.95%
C 99.999% Cr 99.95% Ti 99.9%
Co 99.95% CrO 99.95% TiAl 99.99%
CoCr 99.95% CrMo 99.95% SiO2 99.999%
CoCrB 99.95% CrMoB 99.95% Ni 99.95%
CoCrTa 99.95% CrMoBMn 99.95% NiAl 99.95%
CoTaZr 99.95% CrMoTa 99.95% NiCr 99.95%
CoTaFeZr 99.95% CrW 99.95% NiFe 99.95%
CoFe 99.95% CrV 99.95% NiV 99.95%
CoFeB 99.95% Cu 99.99% W 99.95%
CoFeTa 99.95% FeCoCrB 99.9% WTi 99.95%
CoCr-SiO2 99.95% FeCoTaB 99.9%    
CoCr-TiO2 99.95% FeCoB 99.9%    

7.Thin film of solar cell

Material

Purity

Material

Purity

Material

Purity

Ag

4N

CuGa 4N

NiV

3N

Al

4N

CuInGa 4N

Si

5N

AZO 4N

In

4N

Sn

3N 4N

CdS 4N In2S3 4N

Ti

2N5

CdTe 4N In2Se3 4N

W

3N5

ClGS

4N

ITO

4N

AZO

3N

Cr

2N5-4N

Mo

4N

ZnAl

3N

Cu 4N - -

ZnO

3N5

8. Function thin film sputtering target: Include wear resistant,anti-attrition , corrosion resistant and self lubricating etc series thin film, can coating aiguille,mould, bit tool and so on.Mainly sputtering target of function thin film include chromium target,titanium aluminium target,titanium target,zirconium target,nickel target,tungsten target,stainless steel target,specially alloy target and other metal target. We manufacte titanium aluminium alloy target, chromium target by HIP, composition uniformity, composition uniformity,grain size less than 50um. Also we can offer high pure graphite target(purity>99.999%) be used in Diamond-like Carbon(DLC),silicon target,silicon dioxide target,aluminium oxide target,nitride ceramic target,boride ceramic target,tungsten sulfide ceramic target,molybdenum sulfide ceramic target.

8.1 Coating hard film include chromium target,titanium aluminium alloy target, zirconium target, stainless steel target,titanium carbide target,silicon nitride target,boron nitride target,titanium boride target,boron carbide target etc...

Material

Purity

Material

Purity

Material

Purity

BN 99.9% Ti 99.5% TiW 99.95%
Cr 99.5% TiAl 99.9% WC 99.9%
CrN 99.5% TiB2 99.5% Zr 99.7%
Si 99.999% TiC 99.5% ZrB2 99.55
SS -- TiN 99.5% C 99.99%

8.2 Coating self lubricating film include molybdenum sulfide(MoS2) target, graphite target etc... About the shape of target include disk target, column target, plane target.Also we can manufacture any shape targets by customer's drawing.

Material

Purity

Material

Purity

Material

Purity

C 99.99% MoS2 99.9% - -

 

 

 

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