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Tantalum(Ta) Element

Metals   Alloys  Compounds  Back 

Basic Information

Name: Tantalum
Symbol: Ta
Atomic Number: 73
Atomic Mass: 180.9479 amu
Melting Point: 2996.0 °C (3269.15 °K, 5424.8 °F)
Boiling Point: 5425.0 °C (5698.15 °K, 9797.0 °F)

Number of Protons/Electrons: 73
Number of Neutrons: 108
Classification: Transition Metal
Crystal Structure: Cubic
Density @ 293 K: 16.654 g/cm3

Color: gray

Product  List

Metals (Top)

Name Sign Purity  Shape 
Tantalum Metal Ta  99.95% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Wire, Foil, Tube, Crucible, Rod, Powder

Alloys(Top)

Name Sign Purity  Shape 

Aluminum Tantalum Alloy

AlTa Alloy

Al-Ta13/87

Granules, Powders

Nickel Tantalum Alloy

NiTa Alloy

Ni-Ta 50/50

Ingots

Compounds(Top)

Name Sign Purity  Shape 
Tantalum Boride TaB2 99.95% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)
Tantalum Boride TaB 99.95% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Carbide

TaC

98%-99%

Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Carbide

TaC

99.95%

Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Nitride

TaN

99.95%

Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Nitride

TaN

99.99%

Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Pentoxide Ta2O5 99.99% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets,  Powders(40-300mesh)

Tantalum Silicide 

TaSi2 99.99% Sputtering Target, Evaporation Material,  Granule, Discs, Plates, Sheets,  Powders(40-300mesh)
Tantalum Silicide  Ta5Si3 99.99% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Powders(40-300mesh)
Tantalum Silicide  Ta5Si3 99.5% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Powders(40-300mesh)
Tantalum Suflfide TaS2 99.99% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Powders(40-300mesh)
Tantalum Selenide TaSe2 99.99% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Powders(40-300mesh)
Tantalum Telluride TaTe2 99.99% Sputtering Target, Evaporation Material, Granule, Discs, Plates, Sheets, Powders(40-300mesh)

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