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Al_sputtering_targets.jpgPure Metals/single element Sputtering Targets 


CRM material co.,limited offer a full series of pure metals sputtering targets. Pure metal target and single elements target include low purity (industry class,99%,99.5%,99.9%),high pure (99.9%,99.95%,99.99%) and super/ultra high pure class (99.99%, 99.995%, 99.999%, 99.9995%, 99.9999%).

Primary fabrication method: There 's special performance and special applied for every metal, So the fabrication methods are different. At present, primary fabrication show as below Vacuum Induction Melting (VIM), Vacuum induced levitation melting furnace, Vacuum Sintering, Vacuum Melting &Casting, Vacuum Arc Melting, Hot Pressing (HP), Hot Isostatic Pressing (HIP), Cold Isostatic Pressing(CIP)......

Diamenstion:

disk targets, column targets, step wafer targets,plate targets(Dia<360mm, Thickness >1mm ) 
Rectangle Targets, Slice Targets, Custom-made Targets (Longth <1500mm, Witdh<300mm, Thickness>1mm)
Tube Target / Rotation sputtering Target (Outer Dia < 300mm, Thickness > 2mm) 
 

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