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Your current location :Home > Aluminum Scandium Nitride
Aluminum Scandium Nitride

Scandium-doped aluminum nitride (Al1-xScxN) is a piezoelectric semiconductor material with high dielectric strength. Scandium-doped aluminum nitride (AlScN) is widely used in many devices, such as radio frequency filters, piezoelectric actuators, ultrasonic sensors and so on. The results show that when Sc content exceeds 30%, ferroelectric switching behavior occurs in high Sc doped AlN films.

Aluminum Scandium Nitride Sputtering Targets - AlScN TargetAlScN sputtering target

Purity--- 99.99%

Component - Al(1-x)ScxN

Dimension ---

Discs, Plate, Step ( Dia ≤ 480mm, Thickness ≥ 1mm)
Rectangle, Sheet,Step (Length ≤ 420mm, Width ≤ 210mm, Thickness ≥ 1mm)
Tube( Diameter< 300mm, Thickness >2mm, rotary target)
Application --- Scandium-doped aluminum nitride (AlScN) is widely used in many devices, such as radio frequency filters, piezoelectric actuators, ultrasonic sensors and so on.

Aluminum Scandium Nitride (AlScN) Evaporation materials 

Purity --- 99.99% Component - Al(1-x)ScxN

Shape --- Pieces, Taper, Custom-Made

Dimension --- Piece 0.2-15 mm; Taper, Custom-Made

Application ---

aluminum scandium alloy sputtering targetsRelation Products

High purity Scandium metal;

High purity Scandium sputtering targets;

Scandium Oxide Powder;

Scandium Oxide Granule;

Scandium Oxide Sputtering target;

Scandium Fluoride Powder;

Scandium Fluoride Granule;

Scandium Fluoride Sputtering targets;

Aluminum Scandium alloy Sputtering targets;

Aluminum Scandium master alloy - AlSc;

Aluminum scandium Nitride - Al(1-x)ScxN;

Aluminum Oxide sputtering targets;

Aluminum sputtering targets;

Aluminum nitride sputtering targets;

Aluminum Evaporation Materials - Al;

Aluminum Wire - Al;

Aluminum Foil - Al;

Aluminum Powder - Al;

Aluminum high purity Metal - Al;

Aluminum Sputtering Targets - Al;

Aluminum Oxide Sputtering Target - Al2O3;

Aluminum Oxide Evaporation Material - Al2O3;

Aluminum Oxide Powder - Al2O3;

Aluminum Oxide Ceramic - Al2O3;

Aluminum Oxide Substrate - Al2O3;

Aluminum Fluoride Sputtering Target - AlF3;

Aluminum Fluoride Evaporation Materials - AlF3;

 

 

 

 

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