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Your current location :Home > Chromium Carbide - Cr2C3

Chromium Carbide (Cr3C2)

Chromium Carbide (Cr3C2) Chromium carbide is a ceramic compound that exists in several different chemical compositions: Cr3C2, Cr7C3,and Cr23C6. At standard conditions it exists as a gray solid. It is extremely hard and corrosion resistant. It is also a refractory compound, which means that it retains its strength at high temperatures as well. These properties make it useful as an additive to metal alloys. When chromium carbide crystals are integrated into the surface of a metal it improves the wear resistance and corrosion resistance of the metal, and maintains these properties at elevated temperatures. The hardest and most commonly used composition for this purpose is Cr3C2.

There are three different crystal structures for chromium carbide corresponding to the three different chemical compositions. Cr23C6 has a cubic crystal structure and a Vickers hardness of 976 kg/mm2. Cr7C3 has a hexagonal crystal structure and a microhardness of 1336 kg/mm2. Cr3C2 is the most durable of the three compositions, and has an orthorhombic crystal structure with a microhardness of 2280 kg/mm2. For this reason Cr3C2 is the primary form of chromium carbide used in surface treatment.

Chromium carbide is useful in the surface treatment of metal components. Chromium carbide is used to coat the surface of another metal in a technique known as thermal spraying. Cr3C2 powder is mixed with solid nickel-chromium. This mixture is then heated to very high temperatures and sprayed onto the object being coated where it forms a protective layer. This layer is essentially its own metal matrix composite, consisting of hard ceramic Cr3C2 particles embedded in a nickel-chromium matrix. The matrix itself contributes to the corrosion resistance of the coating because both nickel and chromium are corrosion resistant in their metallic form. After over spraying the coating, the coated part must run through a diffusion heat treatment to reach the best results in matter of coupling strength to the basemetal and also in matter of hardness. Another technique utilizes chromium carbide in the form of overlay plates. These are prefabricated chromium carbide coated steel plates, which are meant to be welded onto existing structures or machinery in order to improve performance. Chromium carbide is used as an additive in cutting tools made out of cemented carbides, in order to improve toughness by preventing the growth of large grains. The primary constituent in most extremely hard cutting tools is tungsten carbide. The tungsten carbide is combined with other carbides such as titanium carbide, niobium carbide, and chromium carbide and sintered together with a cobalt matrix. Cr3C2 prevents large grains from forming in the composite, which results in a fine-grained structure of superior toughness.

Basic Infomation

IUPAC name:Chromium(II) carbide
CAS Number:12012-35-0

ECHA InfoCard: 100.031.420
PubChem: 3650773

Chemical formula:Cr3C2
Molar mass: 180.009 g/mol

Appearance: gray orthorhombic crystals
Density: 6.68 g/cm3
Melting point: 1,895 °C (3,443 °F; 2,168 K)
Boiling point:3,800 °C (6,870 °F; 4,070 K)
Solubility in water:reacts

Crystal structure:Orthorhombic, oP20
Space group:Pnma, No. 62

Chromium Carbide Sputtering Target - Cr3C2

Purity--- 99.5%

Shape--- Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

                Rectangle, Sheet,  Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)

Application ---

Chromium Carbide Evaporation Material - Cr3C2

  • Purity---99.5%
  • Shape---Granule
  • Dimension---1-6mm
  • Application---

Chromium Carbide Powder - Cr3C2

  • Purity---99.5%
  • Dimension--- 150mesh,300mesh,250mesh
  • Application---

Relation Products:

Boron carbide sputtering target - B4C;

Chromium Carbide (Cr3C2) Sputtering Targets - Cr3C2;

Chromium Sputtering Targets - Cr

Chromium Boride Sputtering targets - CrB2 / CrB;

Chromium Carbide Sputtering Targets - Cr3C2;

Chromium Oxide Sputttering Targets - Cr2O3;

Chromium Silicon Sputtering targets - CrSi2 / CrSi;

Chromium doped Silicon monoxide - Cr+SiO;


Boron Carbide(B4C) Sputtering Targets;

Chromium Carbide (Cr3C2) Sputtering Targets;

Hafnium Carbide(HfC) Sputtering Targets;

Iron Carbide (Fe3C) Sputtering Targets;

Molybdenum Carbide (Mo2C) Sputtering Targets;

Niobium Nitride (NbC) Sputtering Targets;

Silicom Carbide (SiC) Sputtering Targets;

Tantalum Carbide (TaC) Sputtering Targets;

Titanium Carbide(TiC) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering Targets;

Tungsten Carbide (W2C) Sputtering Targets;

Tungsten Carbide (WC) Sputtering Targets;

Tungsten Carbide Doped with Nickel (WC+Ni);

Tungsten Carbide Doped with Cobalt (WC+Co);

Vanadium Carbide (VC) Sputtering Targets;

Zirconium Carbide(ZrC) Sputtering Targets;




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