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Your current location :Home > Chromium Nitride - CrN

Chromium Nitride (CrN)

Chromium nitride is a chemical compound of chromium and nitrogen with the formula CrN. It is very hard, and is extremely resistant to corrosion. It is an interstitial compound, with nitrogen atoms occupying the octahedral holes in the chromium lattice: as such, it is not strictly a chromium(III) compound nor does it contain nitride ions (N3−). Chromium forms a second interstitial nitride, dichromium nitride, Cr2N.

 

Chromium(III) nitride can be prepared by direct combination of chromium and nitrogen at 800 °C:

2 Cr + N2 → 2 CrN


It can also synthesize by Physical Vapour Deposition technique such as Cathodic arc deposition.

CrN is used as a coating material for corrosion resistance and in metal forming and plastic moulding applications. CrN is often used on medical implants and tools. CrN is also a valuable component in advanced multicomponent coating systems, such as CrAlN, for hard, wear-resistant applications on cutting tools.

Basic Infomation

IUPAC name:Chromium nitride
Other names:Chromium(III) nitride
CAS Number:24094-93-7
ChemSpider:81581
ECHA InfoCard:100.041.819
Chemical formula:CrN
Molar mass:66.003 g/mol
Appearance:Black powder
Density:5.9 g/cm3
Melting point: 1770 ˚C (decomp.)
Solubility in water:Insoluble
Thermochemistry Std molar entropy (So298):37.75 J K−1 mol−1
Std enthalpy of formation (ΔfHo298):−117.15 kJ/mol

Chromium Nitride Sputtering Target - CrN

Purity--- 99.5%

Shape--- Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

                Rectangle, Sheet,  Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)

Application ---

Chromium Nitride Evaporation Material - CrN

  • Purity---99.5%
  • Shape---Granule
  • Dimension---1-6mm
  • Application---

Chromium Nitride Powder - CrN

  • Purity---99.5%
  • Dimension--- 150mesh,300mesh,250mesh
  • Application---

Relation Products:

Chromium Sputtering Targets - Cr

Chromium Boride Sputtering targets - CrB2 / CrB;

Chromium Carbide Sputtering Targets - Cr3C2;

Chromium Oxide Sputttering Targets - Cr2O3;

Chromium Silicon Sputtering targets - CrSi2 / CrSi;

Chromium doped Silicon monoxide - Cr+SiO;

Aluminum Nitride (AlN) Sputtering Targets;

Boron Nitride (BN) Sputtering Targets;

Chrominium Nitride (CrN) Sputtering Targets;

Gallium Nitride (GaN) Sputtering Targets;

Germanium Nitride (Ge3N4) Sputtering targets;

Hafnium Nitride (HfN) Sputtering Targets;

Magnesium Nitride (Mg2N3) Sputtering Targets;

Niobium Niride (NbN) Sputtering Targets;

Silicom Nitride (Si3N4) Sputtering Targets;

Tantalum Nitride (TaN) Sputtering Targets;

Titanium Carbonitride (TiCN);

Titanium Nitride(TiN) Sputtering Targets;

Vanadium Nitride (VN) Sputtering Targets;

Zirconium Nitride (ZrN) Sputtering Targets;

 

 

 

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