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Hafnium Carbide (HfC)

Hafnium carbide (HfC) is a chemical compound of hafnium and carbon. With a melting point of about 3900 °C it is one of the most refractory binary compounds known. However, it has a low oxidation resistance, with the oxidation starting at temperatures as low as 430 °C.

Hafnium carbide is usually carbon deficient and therefore its composition is often expressed as HfCx (x = 0.5 to 1.0). It has a cubic (rock-salt) crystal structure at any value of x.

Hafnium carbide powder is obtained by the reduction of hafnium(IV) oxide with carbon at 1800 to 2000 °C. A long processing time is required to remove all oxygen. Alternatively, high-purity HfC coatings can be obtained by chemical vapor deposition from a gas mixture of methane, hydrogen, and vaporized hafnium(IV) chloride. Because of the technical complexity and high cost of the synthesis, HfC has a very limited use, despite its favorable properties such as high hardness (>9 Mohs ) and melting point.

The magnetic properties of HfCx change from paramagnetic for x ≤ 0.8 to diamagnetic at larger x. An inverse behavior (dia-paramagnetic transition with increasing x) is observed for TaCx, despite its having the same crystal structure as HfCx.

Basic Infomation

CAS Number:12069-85-1

ECHA InfoCard: 100.031.910

Chemical formula:HfC
Molar mass:190.50 g/mol

Appearance:black odorless powder
Density:12.2 g/cm3[1]
Melting point: 3,900 °C (7,050 °F; 4,170 K)[2]
Solubility in water:insoluble
Crystal structure:cubic, cF8
Space group:Fm3m, No. 225

Hafnium Carbide (HfC) Sputtering Target 

Purity --- 99.9%

Shape --- Discs, Rectangle, Rods, Custom-Made

Dimension --- Discs: Dia(≤480mm), Thickness(≥1mm)

Rectangle: Length(≤420mm), Width(≤270mm), Thickness(≥1mm)

Hafnium Carbide (HfC) Evaporation Materials - HfC

  • Purity --- 99.5%
  • Shape --- Granule
  • Dimension --- 1-6mm
  • Application ---

Hafnium Carbide (HfC) Powder

Purity --- 99.9%

Shape --- Powder

Dimension --- 100mesh, 150mesh, 325mesh

Relation Products

Boron Carbide(B4C) Sputtering Targets;

Chromium Carbide (Cr3C2) Sputtering Targets;

Hafnium Carbide(HfC) Sputtering Targets;

Iron Carbide (Fe3C) Sputtering Targets;

Molybdenum Carbide (Mo2C) Sputtering Targets;

Niobium Nitride (NbC) Sputtering Targets;

Silicom Carbide (SiC) Sputtering Targets;

Tantalum Carbide (TaC) Sputtering Targets;

Titanium Carbide(TiC) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering Targets;

Tungsten Carbide (W2C) Sputtering Targets;

Tungsten Carbide (WC) Sputtering Targets;

Tungsten Carbide Doped with Nickel (WC+Ni);

Tungsten Carbide Doped with Cobalt (WC+Co);

Vanadium Carbide (VC) Sputtering Targets;

Zirconium Carbide(ZrC) Sputtering Targets;




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