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Your current location :Home > Molybdenum Disilicide (MoSi2)

Molybdenum Disilicide (MoSi2) Alloy

Molybednum disilicide sputtering targetMolybdenum Disilicide (MoSi2) Sputtering Target

Purity - 99.9%

Shape - Discs, Plate,Step ( Dia ≤480mm,  Thickness ≥ 1mm)

              Rectangle, Sheet, Step (Length ≤400mm, Width ≤200mm, Thickness ≥1mm) 

Method of manufacturing - Vacuum hot press

Application - microelectronics...

Molybdenum Disilicon (MoSi2) Powder

Purity - 99.9%

Shape - Powder, 300mesh custome-made

Applicaiton -

Molybdenum Disilicide (MoSi2) Heating Element (Drawing)

MoSi2 heating element is a resistance generate-heating component made from MoSi2 or the basic material. It is used in high temperature under the oxidizing atmosphere, it looks like glass in its surface and form a light SiO2 glass film which can protect the element not to be oxidized. So this kind of element has unique effect for resisting oxidization in the high temperature. It is used to the highest temperature up to 1800℃ during oxidizing atmosphere. According to your request, our company can produce the products of Pole, "U", "W" and "U"-right angle shapes, etc..

MoSi2 heating elements can usually make use of furnace temperature from 1300℃ to 1800℃. It is extensively used in the industries of metallurgy, glass, ceramic refractory, crystal electronic device, industrial furnace manufacture, etc.. It is an essential ideal element when the products are sintering in the high temperature.

Molybdenum Disilicide Related Products - MoSi2

Molybdenum Silicide Sputtering target - Mo3Si5

Molybdenum Sulfide Sputtering target - MoS2

Molybdenum Niobium Sputtering Target - MoNb

Tungstem Silicide sputtering target - WSi2

Tantalum Silicide Sputtering target - TaSi2

Molybdenum Disilicide Performance - MoSi2

Molybdenum disilicide (MoSi2, or molybdenum silicide), an intermetallic compound, a silicide of molybdenum, is a refractory ceramic with primary use in heating elements. It has moderate density, melting point 2030 °C, and is electrically conductive. At high temperatures it forms a passivation layer of silicon dioxide, protecting it from further oxidation. It is a gray metallic-looking material with tetragonal crystal structure (alpha-modification); its beta-modification is hexagonal and unstable. It is insoluble in most acids but soluble in nitric acid and hydrofluoric acid.

While MoSi2 has excellent resistance to oxidation and high Young's modulus at temperatures above 1000 °C, it is brittle in lower temperatures. Also, at above 1200 °C it loses creep resistance. These properties limits its use as a structural material, but may be offset by using it together with another material as a composite material.

Molybdenum disilicide and MoSi2-based materials are usually made by sintering. Plasma spraying can be used for producing its dense monolithic and composite forms; material produced this way may contain a proportion of β-MoSi2 due to its rapid cooling.

MoSi2 sputtering targetsMolybdenum disilicide heating elements can be used for temperatures up to 1800 °C, in electric furnaces used in laboratory and production environment in production of glass, steel, electronics, ceramics, and in heat treatment of materials. While the elements are brittle, they can operate at high power without aging, and their electrical resistivity does not increase with operation time. Their maximum operating temperature has to be lowered in atmospheres with low oxygen content due to breakdown of the passivation layer.

Other ceramic materials used for heating elements are e.g. silicon carbide, barium titanate, and lead titanate composite materials.

Molybdenum disilicide is used in microelectronics as a contact material. It is often used as a shunt over polysilicon lines to increase their conductivity and increase signal speed.

Base Information

IUPAC name:Molybdenum disilicide
CAS Number:12136-78-6 Yes
Chemical formula:MoSi2
Molar mass:152.11 g/mol

Appearance:gray metallic solid

Density:6.26 g/cm3[1][2]
Melting point: 2,030 °C (3,690 °F; 2,300 K)[2]
Crystal structure:Tetragonal[1]
Space group:I4/mmm (No. 139), tI6
Lattice constant:a = 0.32112 nm, c = 0.7845 nm




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