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Nickel Boride (Ni2B) |
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IdentifiersNickel borides are inorganic compounds with the chemical formula NixBy, where x and y vary. A common formula is Ni2B, which is available in two forms, known as P−1 and P−2. Other less common borides of nickel are NiB, Ni3B, o-Ni4B3 and m-Ni4B3 (o for orthogonal, m for metastable). Ni2B has been suggested to be an amorphous composed of nickel bonded to individual boron centres. However it contains nanoparticles of nickel which on heating under inert conditions become more crystaline. The two forms P−1 and P−2 differ in terms of amount of their contamination by NaBO2 adsorbed on the surface. P−1 Ni2B has an oxide to boride ratio of 1:4, whereas that of P−2 Ni2B is 10:1. Their properties differ in terms of catalytic efficiency and substrate specificity. The preparation of amorphous nickel boride is simple compared with other borides which requires high temperatures, special techniques and equipment. Nickel boride is in the form of black amorphous powder or black granules. It is insoluble in all solvents, but reacts with concentrated mineral acids. The solid is air stable. As expected for a boride, it has a high melting point. This article focuses mainly on the most common nickel boride, Ni2B.
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Nickel Boride Sputtering Targets - Ni2B Target Purity--- 99.9% Shape---Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm ) Application - Coating for thin film, Chromium(III) boride is an inorganic compound with the chemical formula CrB. It is used in wear resistant coatings. |
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Nickel Boride Evaporation Material - Ni2B Granule Purity - 99.9% Granule - 3-6mm, 1-6mm Application - Coating for thin film |
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Nickel Boride Powder - Ni2B Purity--- 99.9% Granularity --- 100mesh、200 mesh、325mesh |
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Nickel Boron Alloy - other component Purity--- NiB 15%(14-17%), NiB18%(17-21%),NiB25%(23-28%) Shape--- Lumps |
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Relation Products: Boron carbide sputtering target - B4C; Boron Nitride sputtering target - BN; Aluminium Diboride Sputtering target - AlB2; Cerium Hexaboride sputtering targets - CeB6; Chrominium Boride sputtering targets - CrB; Cobalt Boride sputtering target - CoB; Hafnium Diboride (HfB2) Sputtering Target - HfB2; Iron Boride sputtering targets - FeB; Lathanum Hexaboride sputtering targets - LaB6; Magnesium Diboride sputtering targets - MgB2; Molybdenum Diboride sputtering targets - MoB2; Neodymium Boride (NdB) Sputtering Target; Nickel Boride sputtering targets -Ni2B; Niobium Diboride (NbB2) Sputtering target - NbB2; Tantalum Diboride Sputterng target - TaB2; Titanium Aluminum Boron Sputtering Targets - TiAlB; Titanium Diboride sputtering targets - TiB2; Tungsten Diboride Sputtering tarets - WB2; |
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