Tantalum Boride - TaB2 / TaB

Tantalum boride are compounds of tantalum and boron most remarkable for their extreme hardness.

TaB2 has the same hexagonal structure as most diborides (AlB2, MgB2, etc.). The mentioned borides have the following space groups: TaB (orthorhombic, Thallium(I) iodide-type, Cmcm), Ta5B6 (Cmmm), Ta3B4 (Immm), TaB2 (hexagonal, aluminum diboride-type, P6/mmm).
The Vickers hardness of TaB and TaB2 films and crystals is ~30 GPa.Those materials are stable to oxidation below 700 °C and to acid corrosion.

Tantalum Boride Sputtering targets - TaB2/ TaB

Purity--- 99.9%

Shape---Discs, Plate, Step (Dia ≤480mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤420mm, Width ≤270mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm ) 

Application - Coating for thin film

Tantalum Boride Evaporation Material - TaB2 / TaB Granule

Purity - 99.9%

Granule - 3-6mm, 1-6mm

Application - Coating for thin film

Tantalum Boride - TaB2 / TaB Powder

Purity--- 99.9%

Granularity --- 100mesh、200 mesh、325mesh

Related Products

Tantalum Metal targets - Ta;

Tantalum Boride Sputterng target - TaB2;

Tantalum Carbde sputtering target

Tantalum Nitride sputtering target

Tantalum Pentoxide sputtering target, Ta2Ox target

Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2) sputtering targets

Tantalum DisSilicide Sputtering Target - TaSi2

Tantalum Sulfide - TaS2

Tantalum Selenide - TaSe2

Tantalum Telluride - TaTe2

Boron sputtering targets - B;

Boron carbide sputtering target - B4C;

Boron Nitride sputtering target - BN;

Aluminium Diboride Sputtering target - AlB2;

Cerium Hexaboride sputtering targets - CeB6;

Chrominium Boride sputtering targets - CrB；

Cobalt Boride sputtering target - CoB;

Hafnium Diboride (HfB2) Sputtering Target - HfB2;

Iron Boride sputtering targets - FeB;

Lathanum Hexaboride sputtering targets - LaB6;

Magnesium Diboride sputtering targets - MgB2;

Molybdenum Diboride sputtering targets - MoB2;

Neodymium Boride (NdB) Sputtering Target;

Nickel Boride sputtering targets -Ni2B;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Tantalum Diboride Sputterng target - TaB2;

Titanium Aluminum Boron Sputtering Targets - TiAlB;

Titanium Diboride sputtering targets - TiB2;

Tungsten Diboride Sputtering tarets - WB2;

Vanadium Boride (VB2) Sputtering Target - VB / VB2;

Zirconium Diboride Sputtering targets - ZrB2;