Product show


Contact Us

Business talking:

Tel: (86)0791-88101311
Mobile: (86)13317053312
wechat idWechat ID: 13317053312
QQ ID:752340693
Skype ID: minnashu
Your current location :Home > Tantalum Nitride - TaN

Tantalum Nitride - TaN

Tantalum Nitride - TaNTantalum Nitride is an usually compound, It was used in many kinds of industry. CRM supply some products of Tantalum Nitride. Include sputtering target, evaporation material, powder( high purity, or usually pure)

Tantalum Nitride - TaNTantalum nitride (TaN) is an inorganic chemical compound. It is sometimes used tocreate barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on topofsilicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors andhas other electronic applications.

Base information

Other names:Tantalum mononitride
CAS Number:12033-62-4

ECHA InfoCard:100.031.613
EC Number:234-788-4
PubChem CID:82832
Chemical formula:TaN

Molar mass:194.955 g/mol

Appearance:black crystals
Density:14.3 g/cm3
Melting point:3,090 °C (5,590 °F; 3,360 K)
Solubility in water:insoluble
Crystal structure:Hexagonal, hP6
Space group:P-62m, No. 189

Tantalum Nitride Sputtering targets - TaN

Purity - 99.5%

Shape - Discs, Plate, Step ( Dia ≤480mm, Thickness ≥1mm )

Rectangle, Sheet, Step ( Length ≤300mm, Width ≤200mm, Thickness ≥1mm )

Tube ( Diameter< 300mm, Thickness >2mm )

Application - Coating

Tantalum Nitride Evaporation Material - TaN

Purity - 99.5%

Granule - 1-6mm

Application - Coating

Tantalum Nitride Powder - TaN

Purity --- 99.5%

Granularity --- 300 mesh

Related Products

Tantalum Metal targets

Tantalum Boride Sputterng target

Tantalum Carbde sputtering target

Tantalum Nitride sputtering target

Tantalum Pentoxide sputtering target, Ta2Ox target

Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2)

Tantalum DisSilicide Sputtering Target - TaSi2

Tantalum Sulfide - TaS2

Tantalum Selenide - TaSe2

Tantalum Telluride - TaTe2

Aluminum Nitride (AlN) Sputtering Targets;

Boron Nitride (BN) Sputtering Targets;

Chrominium Nitride (CrN) Sputtering Targets;

Gallium Nitride (GaN) Sputtering Targets;

Germanium Nitride (Ge3N4) Sputtering targets;

Hafnium Nitride (HfN) Sputtering Targets;

Magnesium Nitride (Mg2N3) Sputtering Targets;

Niobium Niride (NbN) Sputtering Targets;

Silicom Nitride (Si3N4) Sputtering Targets;

Tantalum Nitride (TaN) Sputtering Targets;

Titanium Carbonitride (TiCN);

Titanium Nitride(TiN) Sputtering Targets;

Vanadium Nitride (VN) Sputtering Targets;

Zirconium Nitride (ZrN) Sputtering Targets;





CopyRight ©2010 China Rare Metal Material Co., Ltd. All rights reservedchina rare metal material co.,ltd