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Your current location :Home > Tantalum Pentoxide - Ta2O5

Tantalum Pentoxide - Ta2O5

Tantalum pentoxide is Ta2O5, also known as tantalum(V) oxide. Both orthorhombic and hexagonal phases are known. Ta2O5 is a high refractive index, low absorption material useful for coatings in the near-UV to IR spectra regions; it decomposes only at temperatures >1470 °C.

Application: Ta2O5 is used to make capacitors in automotive electronics, cell phones, and pagers, electronic circuitry; thin-film components; and high-speed tools. In the 1990s, there was a very strong interest to do research on tantalum oxide as a high-k dielectric for DRAM capacitor applications. For example, Elpida Memory (a Japanese company making DRAM) has put in a strong effort to improve ultrathin tantalum oxide films for DRAM applications. Subsequently in the 2000s, this strong interest has dropped very significantly. It is being used in on-chip MIM capacitors for RF CMOS integrated circuits. Due to its high index of refraction, Ta2O5 has been utilized in the fabrication of the glass of many photographic lenses.

Basic Information

Name:Tantalum pentoxide
Symbol:Ta2O5

Cas number: [1314-61-0]
Molar Mass: 441.893 g/mol
Melting Point: 1872 °C

Solubility in water : insoluble
Crystal Structure: --
Density @ 293 K: 6.085 g/cm3
Color:white, odorless powder

Tantalum pentoxide sputtering target Tantalum Pentoxide Sputtering targets (Ta2O5 Target, White color/Black colar)

Purity--- 99.99%

Shape--- Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤410mm, Width ≤310mm, Thickness ≥1mm)

Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
Good news: CRM developed Ta2O5 sputtering target (black target) )for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...

TaOx Sputtering targetTantalum Pentoxide Sputtering targets (TaOx Target, Black colar)

Purity--- 99.99%

Shape--- Discs, Plate, Step (Dia ≤480mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)

Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
Good news: CRM developed Ta2O5 sputtering target for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...

Tantalum Pentoxide Sputtering targets (TaO5 Target, White color)

Purity--- 99.99%

Shape--- Discs, Plate, Step (Dia ≤48mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤420mm, Width ≤300mm, Thickness ≥1mm)

Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
Good news: CRM developed Ta2O5 sputtering target for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...

Tantalum Pentoxide Evaporation Material - Ta2O5 

Ta2O5 GranuleDensity--- 8.7 g/cm3 Purity--- 99.99%, Dark grey /white tablets or granules
Melting point --- 1880 ℃, Vacuum pressure at 2000℃ 1 Pa, at 2200℃ 10 Pa

Properties of thin film--- 

Transmission range 400 ~ 8000 nm
Refractive index at 550nm 2.10
Hints on evaporation---

Electron-beam gun.
Evaporation temperature 2000 ℃
Oxygen partial pressure 2-5 x 10-5 Torr 
Substrate temperature 175 - 300 ℃

Evaporation Rate 2-5 Å/sec

Source Container tantalum or graphite liner 
Shape--- Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces

Dimension---3-8mm irregular pieces

Application---Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48), Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.

Tantalum Pentoxide Powder

Purity--- 99.99%

Size --- 300mesh, 325mesh Application --- used manufacture tantalum powder, tantalum carbide,sputtering targets,evaporation materials . high pure tantalum pentoxide used for additive of optic glass or manufacture of tantalate crystal.

Relation products:

Tantalum Metal targets

Tantalum Boride Sputterng target

Tantalum Carbde sputtering target

Tantalum Nitride sputtering target

Tantalum Pentoxide sputtering target, Ta2Ox target

Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2)

Tantalum DisSilicide Sputtering Target - TaSi2

Tantalum Sulfide - TaS2

Tantalum Selenide - TaSe2

Tantalum Telluride - TaTe2

Silicon Dioxide sputtering target,

Strontium Titanate sputtering target

Titanium Dioxide sputtering target, TiOx target,

Zirconium Dioxide sputtering target - ZrOx target

 

 

 

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