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Titanium Aluminum (TiAl) Alloy

Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application, CRM will offer the right one for you.

Titanium aluminum sputtering target

Titanium Aluminum (TiAl) Sputtering Targets

Purity --- Al-Ti35/65 at% Al/Ti 50:50 at%,99.95%,99.5%

Shape --- Discs, Plate, Step (Dia ≤450mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤410mm, Width ≤300mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm )

Application --- Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industrials.

Titanium Aluminum (TiAl) Alloy

Purity--- Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt%

Shape--- Granules, Ingot, broken ingot




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