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Tungsten Boride - WB2

Tungsten Boride - WB2Tungsten borides are compounds of tungsten and boron. Their most remarkable property is high hardness. The Vickers hardness of WB or WB2 crystals is ~20 GPa and that of WB4 is ~30 GPa for loads exceeding 3 N.

Single crystals of WB2−x, x=0.07–0.17 (about 1 cm diameter, 6 cm length) were produced by the floating zone method, and WB4 crystals can be grown by arc-melting a mixture of elemental tungsten and boron.
WB2 has the same hexagonal structure as most diborides (AlB2, MgB2, etc.). WB has several forms, α(tetragonal), β (orthorhombic) and δ (tetragonal).
δ-WB and WB2 crystals have metallic resistivities of 0.1 and 0.3 mΩ·cm, respectively. The oxidation of W2B, WB and WB2 is significant at temperatures above 600 °C. The final oxidation products contain WO3 and probably amorphous B2O3 or H3BO3. The melting temnperatures of W2B, WB and WB2 are 2670, 2655 and 2365 °C, respectively.

Tungsten Boride Sputtering targets - WB2 / WB

Purity--- 99.9%

Shape---Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤420mm, Width ≤270mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm ) 

Application - Coating for thin film

Tungsten Boride Evaporation Material - WB2 / WB

Purity - 99.9%

Granule - 3-6mm, 1-6mm

Application - Coating for thin film

Tungsten Boride Powder - WB2 /WB Powder

Purity--- 99.9%

Granularity --- 100mesh、200 mesh、325mesh

Relation Products:

Boron sputtering targets - B;

Boron carbide sputtering target - B4C;

Boron Nitride sputtering target - BN;

Aluminium Diboride Sputtering target - AlB2;

Cerium Hexaboride sputtering targets - CeB6;

Chrominium Boride sputtering targets - CrB;

Cobalt Boride sputtering target - CoB;

Hafnium Diboride (HfB2) Sputtering Target - HfB2;

Iron Boride sputtering targets - FeB;

Lathanum Hexaboride sputtering targets - LaB6;

Magnesium Diboride sputtering targets - MgB2;

Molybdenum Diboride sputtering targets - MoB2;

Neodymium Boride (NdB) Sputtering Target;

Nickel Boride sputtering targets -Ni2B;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Tantalum Diboride Sputterng target - TaB2;

Titanium Aluminum Boron Sputtering Targets - TiAlB;

Titanium Diboride sputtering targets - TiB2;

Tungsten Diboride Sputtering tarets - WB2;

Vanadium Boride (VB2) Sputtering Target - VB / VB2;

Zirconium Diboride Sputtering targets - ZrB2;




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