Pure Metals/single element Sputtering Targets 

Metal Sputtering Target - Alloy Sputtering Target - Ceramic Sputtering Target

Sputtering Target - Customized Sputtering Target - Sputtering Target Application

CRM material co.,limited offer a full series of pure metals sputtering targets. Pure metal target and single elements target include low purity (industry class, 99%, 99.5%, 99.9%), high purity (99.9%,99.95%,99.99%) and super/ultra high purity class (99.99%, 99.995%, 99.999%, 99.9995%, 99.9999%).

Primary fabrication method: There 's special performance and special applied for every metal, So the fabrication methods are different. At present, primary fabrication show as below Vacuum Induction Melting (VIM), Vacuum induced levitation melting furnace, Vacuum Sintering, Vacuum Melting &Casting, Vacuum Arc Melting, Hot Pressing (HP), Hot Isostatic Pressing (HIP), Cold Isostatic Pressing(CIP), roll, forge......

Diamenstion:

disk targets, column targets, step wafer targets,plate targets(Dia<475mm, Thickness >1mm )
Rectangle Targets, Slice Targets, Custom-made Targets (Longth <2000mm, Witdh<300mm, Thickness>1mm)
Tube Target / Rotation sputtering Target (Outer Dia < 200mm)

Pure Metals/single element Sputtering Targets List:

high purity metal sputtering targets and single element sputtering targets include, rare earth metal sputtering targets, refractory metal sputtering targets, black metal sputtering targets, nobel sputtering targets, rare metal sputtering targets, base metal sputtering targets