Aluminum Neodymium Sputtering targets

Aluminum neodymium alloy thin Film be used in Transistor-liquid crystal display (TFT-LCD) for low-resistivity gate metal. Aluminum transition-metal alloys films are adequate for TFT-LCD fabrication because of their low resistivity and their tendency not to form hillocks during thermal processing.

Aluminum Neodymium Sputtering targets (Al-Nd targets )

Purity--- AlNd 97/3, 98/2%

Purity --- 99.99%

Dimension --- Discs, Plate, Step ( Dia ≤ 400mm, Thickness ≥ 1mm)
                          Rectangle, Sheet,Step (Length ≤ 1500mm, Width ≤800mm, Thickness ≥ 1mm)

Application --- Thin Film Transistor-liquid crystal display (TFT-LCD) requires the use of low-resistivity gate metal. Aluminum transition-metal alloys (AI/Nd - 3 wt.% alloy) films are adequate for TFT-LCD fabrication because of their low resistivity and their tendency not to form hillocks during thermal processing.

Relation products

1. Indium Oxide + Tin Oxide (ITO) Sputtering Targets (4N)

2. Silicon Dioxide (SiO2) Sputtering targets

3. Titanium Sputtering Targets

4.Chromium (Cr) Sputtering Targets (3N5)

5. Aluminium sputtering targets (5N)

6. Nickel sputtering targets (3N)

7. Copper sputtering targets (4N)

8. Tantalum sputtering targets (4N)

9. Molybdenum sputtering targts (3N5, 5N)