Molybdenum Niobium Alloy Sputtering Targets, MoNb sputtering target, powder, garnule,evaporation material,sputtering Target, sputter target, sputtering targets, sputter targets,sputtering target material

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Molybdenum Niobium (MoNb) Alloy

Molybdenum Niobium Alloy Sputtering Target ( MoNb Target)

Purity --- Mo/Nb 90/10 wt%
Color: black
Brand Name: CRM
Purity: 99.95%min
Biggest size: Disc 18 inch （457.2mm) diameter, 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm
Relative Density: 99%min
produce way: hot pressing
Production Capacity: about 5000kg per month
Application --- Molybdenum Niobium alloy sputtering target be used in thin film, flat panel display...

CRM material co.,limited produce kinds of sputtering targets for flat panel display as below:

Alumina doped Zinc Oxide sputtering targets (AZO),

Tin doped indium Oxide sputtering target (ITO)

Niobium Oxide sputtering target(Nb2O5, NbOx)

Magnesium fluoride sputtering target (MgF2)

Molybdenum Niobium sputtering target (MoNb), Mo(90)Nb(10)wt%

Antimony doped Tin Oxide sputtering target , ATO(Sb2O3:SnO2)

Silicon sputtering target (Si) Silicon Aluminum sputtering target (SiAl)

Titanium Oxide sputtering target (TiOx, TiO2, TiO ) Niobium doped Titanium Oxide sputtering target (TiOxNb)

Biggest size: Disc 18 inch （ 457.2mm) diameter
Rectangle :450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm
Relative Density: 99%min
Produce way: hot pressing
Production Capacity: about 5000kg per month