Tantalum Carbide - TaC

Tantalum Carbide sputtering targets - TaC

Tantalum Carbide is an usually compound, It was used in many kinds of industry. CRM supply some products of Tantalum Carbide. Include sputtering target, evaporation material, powder( high purity, or usually pure)

Purity - 99.5%

Shape - Discs, Plate,Step (Dia ≤480mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm)

Application - Coating ...

Tantalum Carbide Evaporation Material - TaC

Purity - 99.5%

Granule - 1-10mm

Applicaiton -

Tantalum Carbide Powder

Purity - 99.5%

Granularity --- 300 mesh

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Boron Carbide(B4C) Sputtering Targets;

Chromium Carbide (Cr3C2) Sputtering Targets;

Hafnium Carbide(HfC) Sputtering Targets;

Iron Carbide (Fe3C) Sputtering Targets;

Molybdenum Carbide (Mo2C) Sputtering Targets;

Niobium Nitride (NbC) Sputtering Targets;

Silicom Carbide (SiC) Sputtering Targets;

Tantalum Carbide (TaC) Sputtering Targets;

Titanium Carbide(TiC) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering Targets;

Tungsten Carbide (W2C) Sputtering Targets;

Tungsten Carbide (WC) Sputtering Targets;

Tungsten Carbide Doped with Nickel (WC+Ni);

Tungsten Carbide Doped with Cobalt (WC+Co);

Vanadium Carbide (VC) Sputtering Targets;

Zirconium Carbide(ZrC) Sputtering Targets;