
Titanium Carbide (TiC) |
Titanium Carbide possesses anti high temperature, anti-oxidation, high strength high hardness (the hardness is over HRA90), excellent thermal conductibility , good toughness, violet light shield larger than 80%, excellent electric conductibility, good antiwear and low mear efficiency ; good chemical inertia to iron and steel etc . It is one kind of valuable application materials. |
Titanium Carbide (TiC) Sputtering Targets Purity--- 99.5% Shape--- Discs, Plate,Step (Dia ≤450mm,, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤410mm, Width ≤270mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm ) |
Titanium Carbide (TiC) Powder Purity--- 98%, 99%,99.5% Shape--- Powder,40-300mesh Application---additive in cemented carbides |
Titanium Carbide (TiC) Nanometer Powder Purity---99% Oxygen content --- <0.9wt% Color --- black Crystallographic form --- Cubic Average particle size (D50) --- <40nm Specific surface area --- >50m2/g Apparent density --- 0.08g/cm3 Manufacture method --- Plasma arc vapor Application --- Titanium Carbide nano-powder can be extensively used in many respects, such as antiwear materials, knives, moulds, , grinding materials, ,tool trade, crucibles for smelting metal etc. Raw materials of metal ceramic for making surface metal coatings, bearings ,jets, and cuting tools. The transparent TiC is the very good optical material. |
Relation Products Boron Carbide(B4C) Sputtering Targets; Chromium Carbide (Cr3C2) Sputtering Targets; Hafnium Carbide(HfC) Sputtering Targets; Iron Carbide (Fe3C) Sputtering Targets; Molybdenum Carbide (Mo2C) Sputtering Targets; Niobium Nitride (NbC) Sputtering Targets; Silicom Carbide (SiC) Sputtering Targets; Tantalum Carbide (TaC) Sputtering Targets; Titanium Carbide(TiC) Sputtering Targets; Titanium Carbonitride (TiCN) Sputtering Targets; Tungsten Carbide (W2C) Sputtering Targets; Tungsten Carbide (WC) Sputtering Targets; Tungsten Carbide Doped with Nickel (WC+Ni); Tungsten Carbide Doped with Cobalt (WC+Co); |