Cobalt Boride (CoB)

Cobalt borides are inorganic compounds with the general formula CoxBy. The two main cobalt borides CoB and Co2B. These are refractory materials.

Cobalt boride is known to be exceptionally resistant to oxidation, a chemical property which makes compound useful in the field of materials science. For instance, studies suggest cobalt boride can increase the lifespan of metal parts when used as a coating, imparting surfaces with higher corrosion and wear resistance. These properties have been exploited in the field of biomedical sciences for the design of specialized drug delivery systems.
Cobalt boride is produced under high temperature such as 1500 °C. Coatings of cobalt boride on iron are produced by boriding, which involves first introducing a coating of FeB, Fe2B. On to this iron boride coating is deposited cobalt using a pack cementation process. Cobalt boride nanoparticless in the size range of 18 to 22 nm have also been produced.

Basic Information

Cobalt Boride Sputtering Target - CoB Target

Purity--- 99.9%

Shape---Discs, Plate, Step (Dia ≤480mm, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤420mm, Width ≤270mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm ) 

Application - Coating for thin film, Chromium(III) boride is an inorganic compound with the chemical formula CrB. It is used in wear resistant coatings.

Cobalt Boride Evaporation Material - CoB Granule

Purity - 99.9%

Granule - 3-6mm, 1-6mm

Application - Coating for thin film

Cobalt Boride Powder - CoB

Purity--- 99.9%

Granularity --- 100mesh、200 mesh、325mesh

Cobalt Boron (CoB) Alloy

Composition --- CoB 15%(14-17%), CoB 18%(17-21%), CoB 20%(18-23%)

Shape--- Lump

Relation Products:

Boron sputtering targets - B;

Boron carbide sputtering target - B4C;

Boron Nitride sputtering target - BN;

Aluminium Diboride Sputtering target - AlB2;

Cerium Hexaboride sputtering targets - CeB6;

Chrominium Boride sputtering targets - CrB；

Cobalt Boride sputtering target - CoB;

Hafnium Diboride (HfB2) Sputtering Target - HfB2;

Iron Boride sputtering targets - FeB;

Lathanum Hexaboride sputtering targets - LaB6;

Magnesium Diboride sputtering targets - MgB2;

Molybdenum Diboride sputtering targets - MoB2;

Neodymium Boride (NdB) Sputtering Target;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Nickel Boride sputtering targets -Ni2B;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Tantalum Diboride Sputterng target - TaB2;

Titanium Aluminum Boron Sputtering Targets - TiAlB;

Titanium Diboride sputtering targets - TiB2;

Tungsten Diboride Sputtering tarets - WB2;

Vanadium Boride (VB2) Sputtering Target - VB / VB2;

Zirconium Diboride Sputtering targets - ZrB2;