
Zirconium Diboride (ZrB2) Sputtering Targets |
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Purity: 99.5% Manufacturing Process: Material synthesis ---> Milling ---> HP(Vacuum) ---> Machining ---> Checking ---> Packing Speciafication (Max): Plane circular target: Dia ≤480mm, Thickness ≥1mm Plane Rectangle target: Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Totary Target: Diameter≤ 200mm, Thickness >2mm) Avialable Size: ( in sotre ) Zirconium Diboride sputtering target 25.4mm DiaX 3.175mm thickness Zirconium Diboride sputtering target 25.4mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 50.8mm DiaX 3.175mm thickness Zirconium Diboride sputtering target 50.8mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 76.5mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 76.5mm Dia X 6/35mm thickness Zirconium Diboride sputtering target 101.6mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 101.6mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 127mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 127mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 152.4mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 152.4mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 177.8mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 177.8mm Dia X 6.35mm thickness Zirconium Diboride sputtering target 203.2mm Dia X 3.175mm thickness Zirconium Diboride sputtering target 203.2mm Dia X 6.35mm thickness Custom-made Application: |
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Zirconium Diboride Doped Sputtering targets (ZrB2 target) Purity --- 99.5% Component --- ZrB2+Al2O3, ZrB2+SiC Manufacturing Process: Material synthesis ---> Milling ---> HP(Vacuum) ---> Machining ---> Checking ---> Packing Speciafication (Max): Plane circular target: Dia ≤480mm, Thickness ≥1mm Plane Rectangle target: Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Totary Target: Diameter≤ 200mm, Thickness >2mm) Application --- coating materials |
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Our Advantage about China rare metal material co.,limited (CRM) is an experter in manufacture Zirconium Diboride ceramic sputtering targets as Coating material . All Zirconium Diboride ceramic sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous Ceramic sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zirconium Diboride ceramic sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
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Reference Information about Zirconium Diboride Sputtering targets (ZrB2 target)
ZrB2 parts are usually hot pressed (Pressure applied to the powder with heat being applied) and then machined to shape. Sintering of ZrB2 is hindered by the material's covalent nature and presence of surface oxides which increase grain coarsening before densification during sintering. Pressureless sintering of ZrB2 is possible with sintering additives such as Boron carbide and Carbon which react with the surface oxides to increase the driving force for sintering but mechanical properties are degraded compared to hot pressed ZrB2. Additions of ~30vol% SiC to ZrB2 is often added to ZrB2 to improve oxidation resistance through SiC creating a protective oxide layer - similar to aluminum's protective alumina layer. Basic Information
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Relation Products of Zirconium Diboride Sputtering targets (ZrB2 target) Boron carbide sputtering target - B4C; Boron Nitride sputtering target - BN; Aluminium Diboride Sputtering target - AlB2; Cerium Hexaboride sputtering targets - CeB6; Chrominium Boride sputtering targets - CrB; Cobalt Boride sputtering target - CoB; Hafnium Diboride (HfB2) Sputtering Target - HfB2; Iron Boride sputtering targets - FeB; Lathanum Hexaboride sputtering targets - LaB6; Magnesium Diboride sputtering targets - MgB2; Molybdenum Diboride sputtering targets - MoB2; Neodymium Boride (NdB) Sputtering Target; Nickel Boride sputtering targets -Ni2B; Niobium Diboride (NbB2) Sputtering target - NbB2; Tantalum Diboride Sputterng target - TaB2; Titanium Aluminum Boron Sputtering Targets - TiAlB; Titanium Diboride sputtering targets - TiB2; Tungsten Diboride Sputtering tarets - WB2; Vanadium Boride (VB2) Sputtering Target - VB / VB2; Zirconium Diboride Sputtering targets - ZrB2; Relation Material Zirconium Aluminium alloy - ZrAl Zirconium Niobium Alloy - ZrNb Zirconium Silicon Alloy - ZrSi Zirconium Ytterium Alloy - ZrY
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