Hafnium Boride Evaporation Materials(HfB2)

Hafnium Boride Evaporation Materials - HfB2

Purity--- 99.9%

Manufacturing Process

Granule: HP/CIP Sinter---> Crush ---> Screening ---> Checking ---> Packing

Talbed: Material synthesis ---> Milling ---> Screening ---> CP(Forming) ---> Sinter ---> Checking ---> Packing

Specification

Granular: 3-6mm, 1-10mm

Tablet: Dia10mmX5mm, custom-made

Our Advantage about Hafnium Boride Evaporation Materials

China rare metal material co.,limited (CRM) is an experter in manufacture Hafnium Boride Evaporation Materials as evaporation material . All Hafnium Boride Evaporation Materials are manufacture by programs with  with the highest possible density and smallest possible average grain size.. 

CRM material co.,limited is specialized in making virous sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. 

All Hafnium Boride Evaporation Materials are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP).

Reference Information about Hafnium diboride Evaporation Materials

Hafnium diboride is an ultrahigh temperature ceramic composed of hafnium and boron. It has a melting temperature of about 3250 degrees Celsius. It is an unusual ceramic, having relatively high thermal and electrical conductivities, properties it shares with isostructural titanium diboride and zirconium diboride. It is a grey, metallic looking material. Hafnium diboride has a hexagonal crystal structure, a molar mass of 200.11 grams per mole, and a density of 10.5 grams per cubic centimeter.

Hafnium diboride is often combined with carbon, boron, silicon, silicon carbide, and/or nickel to improve the consolidation of the hafnium diboride powder (sintering). It is commonly formed into a solid by a process called hot pressing, where the powders are pressed together using both heat and pressure.

The material has potential for use in hypervelocity reentry vehicles such as ICBM heat shields or aerodynamic leading-edges, due to its strength and thermal properties. Unlike polymer and composite material, HfB2 can be formed into aerodynamic shapes that will not ablate during reentry.

Hafnium diboride is also investigated as a possible new material for nuclear reactor control rods. It is also being investigated as a microchip diffusion barrier. If synthesized correctly, the barrier can be less than 7 nm thick.

Base information:

Relation Products:

Boron sputtering targets - B;

Boron carbide sputtering target - B4C;

Boron Nitride sputtering target - BN;

Aluminium Diboride Sputtering target - AlB2;

Cerium Hexaboride sputtering targets - CeB6;

Chrominium Boride sputtering targets - CrB；

Cobalt Boride sputtering target - CoB;

Hafnium Diboride (HfB2) Sputtering Target - HfB2;

Iron Boride sputtering targets - FeB;

Lathanum Hexaboride sputtering targets - LaB6;

Magnesium Diboride sputtering targets - MgB2;

Molybdenum Diboride sputtering targets - MoB2;

Neodymium Boride (NdB) Sputtering Target;

Nickel Boride sputtering targets -Ni2B;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Tantalum Diboride Sputterng target - TaB2;

Titanium Aluminum Boron Sputtering Targets - TiAlB;

Titanium Diboride sputtering targets - TiB2;

Tungsten Diboride Sputtering tarets - WB2;

Vanadium Boride (VB2) Sputtering Target - VB / VB2;

Zirconium Diboride Sputtering targets - ZrB2;